The CEO of German lens manufacturer Zeiss’s semiconductor business, Frank Rohmund, believes that while China might be 14 years behind current Western chip manufacturing technology, restrictions on the country will serve to accelerate its pace of innovation. The executive made the remarks to Bloomberg during the SEMICON conference in Taiwan, and he added that China’s advances in deep ultraviolet (DUV) lithography have to be evaluated on several parameters before comparing them to non-Chinese technology. Zeiss Executive Says China’s Progress In DUV Lithography Technology Is Unsurprising Owing to Western restrictions, news about Chinese lithography developments are almost always intensely scrutinized. For […]
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