Reuters Yonhap News

    UBS: “China’s EUV Technology at ASML’s 2004 Level… Difficult to Develop Alternative Within 10 Years”

    China is striving for semiconductor self-sufficiency, but a recent analysis suggests that it still cannot overcome the dominance of ASML from the Netherlands in the field of lithography equipment. In particular, China’s cutting-edge extreme ultraviolet (EUV) lithography technology is reportedly comparable to ASML’s level in 2004, making it unlikely that China will secure a practical…

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