Global Market Driven by PCB Demand, Automation, and Sustainability Trends:
The Dry Film Photoresist (DFPR) Market is expanding rapidly, supported by surging demand for miniaturized PCBs in consumer electronics, EVs, and 5G infrastructure. With Asia-Pacific leading production and consumption, the market is shaped by innovations in photolithography, automation, and eco-friendly formulations.
❓ What Is the Market Size of the Dry Film Photoresist Market?
In 2024, the global market size of Dry Film Photoresist was estimated to be worth US$ 939 million and is forecast to reach approximately US$ 1191 million by 2031 with a CAGR of 3.5% during the forecast period 2025-2031.
Source: https://reports.valuates.com/market-reports/QYRE-Auto-12W548/global-dry-fotoresist
❓ What Is Driving the Growth of the Dry Film Photoresist Market?
🔹 Major Growth Factors
• 📦 Increased demand for advanced packaging and printed circuit boards (PCBs)
• 📏 Need for high-resolution patterning in compact electronic devices
• 🌱 Preference for low-waste dry film technology over liquid alternatives
• ⚙️ Adoption of automation in PCB fabrication, improving efficiency and consistency
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🧮 How Is the Market Segmented?
🔹 By Type
• Standard Dry Film
• Photoimageable Solder Resist
• Others
🔹 By Application
• PCB Fabrication (Rigid, Flexible, HDI)
• IC Packaging & Substrates
• Lead Frame / Chemical Milling
• Automotive Electronics
🔹 By Region
• Asia Pacific – 73%
• Americas – 17%
• Europe – 8%
👥 Who Are the Top Players in the Dry Film Photoresist Market?
• Asahi Kasei
• Eternal
• Showa Denko Materials
• 🔹 Top 3 players hold ~80% global market share
• 🔹 Japan leads global production with >55% share
• 🔹 Taiwan and U.S. follow in volume
• 🔹 Asia-Pacific is the largest consumer market
🧾 What Is the Role of Dry Film Photoresist in the Industry?
Dry film photoresists are essential in image transfer processes for:
• PCB fabrication (Rigid, Flexible, HDI)
• IC packaging and substrates
• Chemical milling and lead frames
• Automotive and LED electronics
Its superior adhesion, high pattern resolution, and low waste output make it a preferred photolithography solution in both traditional and emerging applications.
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This release was published on openPR.
